High Density Chip Interconnect Technology
Office:
DOE Office of High Energy Physics
Topic Description:
Grant applications are sought for the development of new technologies for reducing cost while increasing the density of interconnection of pixelated sensors to readout electronics by enhancing or replacing solder bump-based technologies. Development of cost-effective technologies to connect arrays of thinned integrated circuits (< 50 microns, with areas of ~2x2 cm^2) to high-resistivity silicon sensors with interconnect pitch of 50 microns or less are of interest. Technologies are sought that can minimize dead regions at device edges and/or enable wafer-to-wafer interconnection, by utilizing 3D integration with through-silicon vias or other methods.
Document Page Number:
128
Department:
Online link:
https://science.osti.gov/-/media/sbir/pdf/TechnicalTopics/FY2020_Phase_I_Release_2_Topics.pdf?la=en&hash=935C6CA9A54809788F388CAC3E8A8A1E2B626C10
Topic ID:
34d
Expiration date:
Monday, February 24, 2020